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Stock Symbol: NASDAQ: NANO
Market Value: N/A (in millions)

We are a leader in the design, manufacture, and marketing of high-performance process control metrology systems used in the manufacture of silicon and compound semiconductor substrates, devices and integrated circuits. Our metrology systems measure various optical and physical thin film properties, critical circuit dimensions and layer-to-layer circuit alignment (overlay). The accurate alignment, or overlay, of successive film layers, relative to each other, across the wafer is critical for device performance and favorable production yields. Customers use our process control and metrology systems during various steps of the manufacturing process, enabling semiconductor and integrated circuit manufacturers to improve yields, increase productivity and lower their manufacturing costs.

We were incorporated in California in 1975 and reincorporated in Delaware in 2006. We have been a pioneer and innovator in the field of optical metrology.